Titanium Sputtering Targets

Category

Minerals & Metallurgy

Sub-Category

Aluminum

Completed orders

0

Price

$100.00

Delivery Cost

$100.00

Minimum Order

0 pieces

Location

Zhuozhou City, Hebei Province,P.R. CHINA, , ,

Titanium Sputtering Targets

Titanium is a common material used in a wide variety of products such as watches, drills, laptops and bicycles. Pure titanium is silvery-white in color and has a brilliant luster. It has a melting point of 1,660°C, a density of 4.5 g/cc and a vapor pressure of 10 -4 Torr at 1,453°C. Titanium is a strong material that is easy to work with when heated. Its strong, lightweight properties and excellent corrosion resistance make it ideal for ocean liner hulls, aircraft engines and designer jewelry. Titanium is biocompatible and can be used in surgical instruments and implants. Titanium is typically evaporated in a vacuum for wear and decorative, semiconductor and optical coatings.

Titanium sputtering targets are a versatile material with 20 variants. They are commonly used as sputtering targets in thin film deposition processes. Titanium's high strength, light weight, corrosion resistance and biocompatibility allow it to be used for surface coatings in applications ranging from semiconductors to medical implants.

Improve wear resistance, reduce friction coefficient and prevent adhesion. It is a kind of coating on CNC tools. The titanium nitride sputtering target coating is golden yellow, Vickers hardness is about 2300hv, and the maximum service temperature is 500 ℃. It is a kind of high cost-effective coating widely used in CNC tools. It can also form composite coating with other elements such as aluminum and carbon, such as AlTiN

Product Advantages

High Density

Optimal, homogeneous microstructure

Highest material purity

Excellent product quality

Custom Titanium Sputtering Target Options

We support full customization for R&D and production needs:

Custom dimensions, purity grades, and bonding options

Alloy targets (TiAl, TiSi, TiW) available for enhanced film properties

Prototype-to-mass production flexibility

Technical support for process optimization

Specification

Data 1: chemical compostion of Titanium target

Item:

N

C

H

Fe


AI

V

GR1

0.03

0.08

0.05

0.2

0.18

 

 

GR2

0.03

0.08

0.015

0.3

0.25

 

 

GR3

0.03

0.08

0.015

0.3

0.35

 

 

GR4

0.05

0.08

0.015

0.5

0.4

 

 

GR5

0.05

0.08

0.015

0.4

0.2

5.5-6.75

3.5-4.5

GR6

0.03

0.08

0.015

0.3

0.2

4.0-4.6

 

GR7

0.03

0.08

0.015

0.5

0.25

 

 

GR9

0.03

0.08

0.015

0.25

0.15

2.5-3.5

2.0-3.0

GR11

0.03

0.08

0.015

0.2

0.18

 

 

GR12

0.03

0.08

0.015

0.3

0.25

 

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